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You are here: Home / Materials/Chemicals / Process or Materials Review Requests (PROM) and Form / 2017 PROM Requests / 20170321 F. Liu- Deposit LPCVD nitride on 10 nm ALD Al2O3

20170321 F. Liu- Deposit LPCVD nitride on 10 nm ALD Al2O3

PROM form for procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean). Request approved.

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