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STSetch2 Characterizations

This project covers etch baseline and development characterization of the STSetch2 system.
SOI etch-Khuri-Yakub Group
Target of this project is deeper etches of ~250 micron using SPR-220-7.
High Aspect Ratio/Narrow Trenches
Project proposal for stsetch2 characterization by Justin Snapp (Coral: jsnapp).

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