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EE410 and EE312

EE410 was a CMOS IC Fabrication lab course until winter 2015 quarter. For winter 2016, the class was changed from CMOS to Depletion mode NMOS fabrication. In winter 2017 quarter, the class was renumbered as EE312.
SNF410 NMOS process flow without isolation
This is the run sheet for the depletion NMOS process set up by Lisa Rozario. This process is a modification of the EE410/EE312 depletion NMOS process utilized in winter 2016 EE410 and winter 2017 EE312 and uses the mask set "Depletion NMOS_SNF410"
SNF410 Depletion NMOS Report
This is the final report for the depletion NMOS process set up by Lisa Rozario. This process is a modification of the EE410/EE312 depletion NMOS process utilized in winter 2016 EE410 and winter 2017 EE312 and uses the mask set "Depletion NMOS_SNF410"

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