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You are here: Home / Process / Fab Project Courses: E241 & EE412 / Winter '11 / Final Reports / SiGe Low Stress Film

SiGe Low Stress Film

Low stress/low temperature LPCVD SiGe film developed for MEMS on CMOS applications.

PDF document icon EE412_Team_SiGe_Final_Report.pdf — PDF document, 1285 kB (1316519 bytes)

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