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Photoresist Stripping Chart

This table gives labmembers a quick reference to determine what equipment set is to be used for the stripping of resist and plasma etching produced polymer for a given cleanliness level.
      wbnonmetal wbmetal wbflexcorr-3and-4 wbflexcorr-1and-2 gasonics matrix
Nonmetal Clean wet X          
    wet/dry X       X  
  Contaminated wet     X X  
    wet/dry     X X   X
Metal Semi-clean wet   X    
 
    wet/dry   X     X  
  Contaminated wet     X X    
    wet/dry     X X   X

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