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EE410 Device

This device is an abbreviated MOS structure run every year in the EE410 class. Though not really a "baseline" process for the lab, the process/mask set routinely produces functional devices that many researchers use as a starting point for their experiments.

EE410 process flow was last used during the class in 2015.  The run sheet used during the course with modified equipment names (to reflect current equipment set) can be found here: EE410_Runsheet_2015

An older version of the process runsheet for the EE410 class can be found here:  EE410 Runsheet 2007-8

The EE410 class website can be accessed here:

This site has detailed information about the process, the layout, and testing.

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