ASML Target Marks using Amtetcher
To etch 120nm zero or global alignment marks in Si in order that subsequent mask layers may be aligned. Limited to four inch wafers.
Time of Execution:
Approx. 30 minutes for 24 wafers.
Recipe: Program 4
Time: 5 minutes
Resist Strip: Photoresist Strip for Nonmetal Wafers- wet
Detailed Procedure:Please see Amtetcher