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Summary of Resist Stripping, Descum and Polymer Removal

This chart describes the tools and processes available for resist stripping, descum and polymer removal at SNF.
Tool
Process
Recipe
Cleanliness
Level
Etch Rate
Drytek2 Resist Strip
Resist Strip Clean, Semi-clean and Contaminated
 40nm/min
Drytek2 Descum/Polymer
Removal

Descum and Polymer
Clean-up
Clean, Semi-clean and Contaminated  20nm/min
Amtetcher  Descum/Polymer
Removal
   Clean and
Semi-clean
 
Drytek4 Resist Strip Resist Strip Contaminated  
Drytek4 Descum/Polymer
Removal
  Contaminated  
Gasonics Resist Strip Varied Clean and
Semi-clean
 fast
Matrix Resist Strip  SDTO2STr Contaminated ~500nm/min
 Mrc  Resist Strip
 Resist Strip
 Contaminated  130nm/min

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