KOH Etching at SNF
Purpose:Etching along crystal planes in Silicon.
Please note that there is clean quartzware available for KOH etching. If it is used, the wafers can be de-contaminated at wbdecon and brought back to a clean condition.
Time of Execution:
Depends on the depth of the etch. There is about a 45 minute set-up time before etching can begin.
30% KOH in water at 80C etches about 1um/min.
Please see KOH Etching of Si for complete details on the procedure
Also, please see Wet Bench Flexcorr-3 and -4 for details on the operation of the wet bench.