TMAH Si Etching at SNF
Silicon Etching Using TMAH at SNF
Please note that by using clean quartzware the wafers may be brought back to a clean state.
wbflexcorr-3 and -4
Time of Execution:
Depends on the depth of the etch. There is an approximate 30 minute set-up time.
20% TMAH at 95-100C etches about 1.2um/min.
Please see TMAH Etching of Silicon for more details on the etching procedure.
Please see Wet Bench Flexcorr-3 and-4 for more information on the wet bench.