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TMAH Si Etching at SNF

This process module describes TMAH Silicon etching at SNF.

Silicon Etching Using TMAH at SNF


 Etching Si.

Please note that by using clean quartzware the wafers may be brought back to a clean state.


 wbflexcorr-3 and -4

Time of Execution:

 Depends on the depth of the etch.  There is an approximate 30 minute set-up time.


Step Summary:

 20% TMAH at 95-100C etches about 1.2um/min.


Detailed Procedure:

 Please see TMAH Etching of Silicon for more details on the etching procedure.

Please see Wet Bench Flexcorr-3 and-4 for more information on the wet bench.

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