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Standard Nitride Strip, clean

This module describes nitride stripping at wbnitride.


The Nitride Wet Bench is used for hot phosphoric acid stripping of nitride films from silicon or quartz substrates. This Wet Bench contains a hot pot, in addition to dump rinse and spin-rinse-dry modules.





Time of Execution:

Depends on the amount of nitride to be stripped.  There is about a 45 minute set-up time before the strip.



Step Summary:

Hot pot at wbnitride heated to 155C.
Etch rates- nitride = 32A/min, Ox = 0.8A/min, Si = 0.8A/min
6 cycles rinse in dump rinser
Dry in spin dryer



Detailed Procedure:

Please see wbnitride for complete details on the procedure.

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