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Standard Nitride Strip, clean

This module describes nitride stripping at wbnitride.

Purpose:

The Nitride Wet Bench is used for hot phosphoric acid stripping of nitride films from silicon or quartz substrates. This Wet Bench contains a hot pot, in addition to dump rinse and spin-rinse-dry modules.

 

Equipment:

wbnitride

 

Time of Execution:

Depends on the amount of nitride to be stripped.  There is about a 45 minute set-up time before the strip.

 

 

Step Summary:

Hot pot at wbnitride heated to 155C.
Etch rates- nitride = 32A/min, Ox = 0.8A/min, Si = 0.8A/min
6 cycles rinse in dump rinser
Dry in spin dryer

 

 

Detailed Procedure:

Please see wbnitride for complete details on the procedure.

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