Lift Off Procedures
"Lift-off" is a simple, easy method for patterning deposited films and films which are difficult to dry etch. A pattern is defined on a substrate using photoresist and standard photolithography. A film, usually metallic, is blanket-deposited all over the substrate, covering the photoresist and areas in which the photoresist has been cleared. During the actual lifting-off, the photoresist under the film is removed with solvent, taking the film with it, and leaving only the film which was deposited directly on the substrate.