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List of Available Photoresists

EBEAM and OPTICAL PHOTORESISTS

Resist/Developer Spin Speed Thickness Application Tool
SPR 3612/MF 26A
5000rpm/2000rpm 1µm & 1.6µm I AND G SVG track 1 and 2, Headway and Laurel
SPR 3617M/MF 26A
  1.2µm & 1.6µm Dyed version of SPR3612, for transparent substrates
Headway and Laurel

SPR220-7/MF 26A

3500rpm/1000rpm 7µm & 10, 15µm Micromachining SVG track 1, Headway and Laurel
SPR220-3/MF 26A
  3 - 4 µm   SVG track 1, Headway and Laurel

AZ4620/MF319 limited access/phase out on 4620

Dev AZ400K limited access/phase out

4000rpm/1000rpm 7 & 18 µm Micromachining  

AZ5214IR / MF 26A

5000rpm 1.26, 1.4, 1.6, and 2.0 µm Image Reversal, used as a negative resist
SVG track 2, Headway and Laurel
LOL2000     Lift off under layer  
SPR 955CM/MF 26A

0.7µm and 1µm I line SVG track 2, Headway and Laurel

   
 

   
 
EBEAM Resist/Dev*        
UVN2/CD26*     Neg  
UVN30/CD26*     Neg/like UVN2  
UV5*     Pos  

   
 
PMMA* 5%/MIBK:IPA 1:2 is std ratio, varies        
200 PMMA C5/same*        
950 PMMA M2/same*        
PMMA 200K/same*        
PMMA 950K 9%/same*        
PMMA 496K 9%/same*        
PMGI SF6/PMGI 101*        
PMGI 6% in cyclopertanon/PMGI 101*     Phase out  
ZEP 520*        
APEX-E/MF319*        
SAL601/MF322*        
Thinners Use      
Type P Thinner        
Primers Use      
MicroPrime HP 100% svgcoat vapor prime      


     

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